To understand this text there are some prerequisites. A basic foundation in lithography science is assumed. The SPIE Handbook on Microlithography, Micromachining and Microfabrication. Volume 1: Microlithography l provides a suitable introduction. It is also assumed that the reader has had some introduction to basic statistical concepts and statistical process control. It is my intention that this text be a self-contained tutorial on lithography process control for readers familiar with the prerequisite lithography science and basic statistical process control, although some subjects may involve a higher level of mathematical sophistication than others. The text covers the subject of lithography process control at several levels. Discussions of some very basic elements of statistical process control and lithography science are included, because, when trying to control a lithography process, a number of subtle problems arise that are related to fundamental issues. To most readers, the information presented on the foundations of statistical process control should be familiar. Nevertheless, it is useful to review the foundations of statistical process control, in order to clearly identify those circumstances in which the method may be applied, and where it needs to be applied with particular care. This inclusion of basic topics also allows the text to serve as an introduction to process control for the novice lithography engineer and as a reference for experienced engineers. More advanced topics are also included to varying

ASML 2007出版的光罩操作手册，内容详尽，4x和5X都有涉及，对于刚入门的光刻工艺工程师（litho PE）应该有所帮助

7nm Litho (2017)

The second edition of this volume is written not only as an introduction to the science and technology of microlithography, but also as a reference for those who with more experience so that they may obtain a wider knowledge and a deeper understanding of the field. The purpose of this update remains consistent with the first edition published in 1998 and edited by Dr. James R. Sheats and Dr. Bruce W. Smith. New advances in lithography have required that we update the coverage of microlithography systems and approaches, as well as resist materials, processes, and metrology techniques.

主要内容： 本课程围绕超大规模集成电路制造中的先进光刻技术，陈 述与之相关的理论、设备、材料、测量与控制等。为了适应当前先进光 刻的需求，本课程会重点讲述在14nm及以下节点广泛使用的计算光刻、 分辨率增强技术以及设计-工艺联合优化技术等。 • 授课目标： 掌握光刻技术的原理，对计算光刻技术进行深入研讨 • 授课对象： 微电子学与固体电子学专业，集成电路制造专业研究生