[{"title":"( 4 个子文件 253KB ) COMSOL等离子体仿真技术在MPCVD装置及H2放电低气压环境的应用研究","children":[{"title":"COMSOL等离子体仿真:MPCVD装置仿真与H2放电低气压MPCVD放电的等离子体沉积刻蚀仿真.html <span style='color:#111;'> 233.17KB </span>","children":null,"spread":false},{"title":"COMSOL等离子体仿真技术在MPCVD装置及H2放电低气压环境的应用研究.pdf <span style='color:#111;'> 118.56KB </span>","children":null,"spread":false},{"title":"等离子体仿真技术在MPCVD装置与H2放电环境下的应用及沉积刻蚀研究.docx <span style='color:#111;'> 37.34KB </span>","children":null,"spread":false},{"title":"COMSOL等离子体仿真与MPCVD装置仿真:H2放电低气压MPCVD放电及等离子体沉积刻蚀仿真.docx <span style='color:#111;'> 37.58KB </span>","children":null,"spread":false}],"spread":true}]