计算光刻方面最权威的电子书，2010年版 ' Computational Lithography ' by Xu Ma, Gonzalo R. Arce

Principles of Lithography -4

超大规模集成电路先进光刻理论与应用.pdf Advanced Processes for 193-nm Immersion Lithography (SPIE Press Monograph Vol. PM189).pdf 合集

紫外光刻机使用及维护指南。感谢您购买本所设备，使用前请仔细阅读本说明书！

Resolution Enhancement Techniques in Optical Lithography

基于石墨烯超棱镜的缩小成像纳米光刻技术，赵慧杰，韩利红，衍射极限一直是光学成像领域中的基本障碍。超棱镜成像能包含在衰逝场在内的所有光场能量，突破光学分辨率极限，对推动包括超高分

半导体工艺，有关光刻很好的书，也是当前最新的书 ISBN-10: 0470727306 可以在www.amazon.com上找到此书详细信息

Nanotechnology has great potential in manufacturing, manipulating, observing, and functioning of materials, and understanding the physics and chemistry at the nanoscale, but it is limited to surface science and technology in two dimensions, with use of, for example, e-beam, ion beam, light beam, and atomic force through the processes of illumination, deposition, etching, andmodification of the surface. Available nanotechnological devices such as nanoelectronic circuits, high-density data storage, liquid-crystal displays, and micro and nanoelectromechanical systems (MEMSs and NEMSs) are all basically of two dimensions. However, future nanotechnology, in particular nanomanufacturing, should be made in three dimensions similar to the existing ordinary machinery. In the book Engines of Creation: The Coming Era of Nanotechnology (Doubleday, 1986), the author Eric Drexler discusses future nanotechnologies such as molecular assemblers, atom-by-atom building, and self-replicating machines. In the novel Prey (Harper Collins, 2002), Michael Crichton describes a machine that makes nanobots from bacteria, which turn into a nano-swarm attacking humans. The nanomachines appearing in those books are all three-dimensional machines.