光刻技术是所有微纳器件制造的核心技术。在集成电路制造中，正是由于光刻技术的不断提高才使得摩尔定律得以继续。本书覆盖现代光刻技术的重要方面，包括设备、材料、仿真（计算光刻）和工艺。在设备部分，对业界使用的主流设备进行剖析，介绍其原理结构、使用方法、和工艺参数的设置。在材料部分，介绍了包括光刻胶、抗反射涂层、抗水涂层、和使用旋图工艺的硬掩膜等材料的分子结构、使用方法，以及必须达到的性能参数。本书按照仿真技术发展的顺序，系统介绍基于经验的光学邻近效应修正、基于模型的光学邻近效应修正、亚曝光分辨率的辅助图形、光源-掩模版共优化技术和反演光刻技术。如何控制套刻精度是光刻中公认的技术难点，本书有一章专门讨论曝光对准系统和控制套刻精度的方法。另外，本书特别介绍新光刻工艺研究的方法论、光刻工程师的职责，以及如何协调各方资源保证研发进度。

Nanotechnology has great potential in manufacturing, manipulating, observing, and functioning of materials, and understanding the physics and chemistry at the nanoscale, but it is limited to surface science and technology in two dimensions, with use of, for example, e-beam, ion beam, light beam, and atomic force through the processes of illumination, deposition, etching, andmodification of the surface. Available nanotechnological devices such as nanoelectronic circuits, high-density data storage, liquid-crystal displays, and micro and nanoelectromechanical systems (MEMSs and NEMSs) are all basically of two dimensions. However, future nanotechnology, in particular nanomanufacturing, should be made in three dimensions similar to the existing ordinary machinery. In the book Engines of Creation: The Coming Era of Nanotechnology (Doubleday, 1986), the author Eric Drexler discusses future nanotechnologies such as molecular assemblers, atom-by-atom building, and self-replicating machines. In the novel Prey (Harper Collins, 2002), Michael Crichton describes a machine that makes nanobots from bacteria, which turn into a nano-swarm attacking humans. The nanomachines appearing in those books are all three-dimensional machines.